ASH’ARI, N. A. N.; MOHAMAD, M. DEEPSEEK FOR ACADEMIC WRITING: ODL TERTIARY STUDENTS’ ACCEPTANCE THROUGH THE TECHNOLOGY ACCEPTANCE MODEL (TAM). INTERNATIONAL JOURNAL OF EDUCATION, PSYCHOLOGY AND COUNSELLING (IJEPC), [S. l.], v. 10, n. 61, p. 1290–1309, 2025. DOI: 10.35631/IJEPC.1061089. Disponível em: https://gaexcellence.com/ijepc/article/view/6765. Acesso em: 31 dec. 2025.